Test facilities – SEM

Evo 18 SEM Facility

EVO 18 SEM is the scanning electron microscope from Carl Zeiss, Germany System Speciication
Filament : Tungsten
Secondary e-image resolution : 50 NM
(Depends on sample)
BSD Detector: Available
Tilt : 0 – 60 Degree
Rotation : 360 Degree
EHT : 200V – 30KV
Magnification : Up to 50K ~ 100K
(Depends on sample)

Process Capabilities

Imaging Modes: Surface & Cross-Sectional
Sample Holder: Maximum 9 stubs (~1 CM Dia.) can be mounted
Substrates Used : Si, Glass, Sapphire, Ge
Substrate Size : (2 x 2 x Z)MM to (10 x 10 x Z)MM [For surface imaging]
(4 x 4 x Z)MM to (8 x 8 x Z)MM [For crosssectional imaging]
where Z is the variable substrate thickness (it can vary from 200 microns to 2 mm), depending on
the substrate type like: Si / glass substrates.

Applications

  • Microstructure characterization of metals, hybrid metallic structures and multiple principal element alloys
  • The effect of processing routes (thermomechanical processing, heat treatment, etc.) on microstructure evolution
  • Fracture surface characterization for the determination of fracture mode
  • Precipitation characterization by SEM correlated with EDS for chemical analysis
  • Analysis of crack propagation by SEM and, in turn, of the relationship between microstructure and fracture resistance